Living Quarters

NuFlare Orders Next-Gen Photomask Registration and Overlay Metrology

Manufacturing Close – Up, Dec 3, 2008

NuFlare Technology, a supplier of e-beam based mask writers for lithography masks, has ordered one of the first Prove systems for Photomask Registration and Overlay Metrology from Carl Zeiss SMT.

Frank P. Averdung, Managing Director at Carl Zeiss SMT’s Semiconductor Metrology Systems division (SMS), considers the NuFlare order as a “crucial breakthrough:” “Supported by Sematech, we have successfully developed a future-oriented design concept for these systems that will play a decisive role in lithography. Both 193nm lithography including Double Patterning and EUVL will significantly benefit from the unprecedented accuracy of the system. With NuFlare’s selection of ZEISS, our system has been acknowledged as the de facto standard for calibration of the leading photomask writing tools.”

Yasuaki Miura, President of NuFlare Technology said: “NuFlare is convinced that the Prove system of Carl Zeiss SMT enables a dramatic performance imProvement of our mask writing systems
port 25 blocked